Photodegradation of diphenylarsinic acid by UV-C light: Implication for its remediation
Wang, AA; Teng, Y; Hu, XF; Wu, LH; Huang, YJ; Luo, YM; Christie, P; Luo, YM (reprint author), Chinese Acad Sci, Inst Soil Sci, Key Lab Soil Environm & Pollut Remediat, Nanjing 210008, Jiangsu, Peoples R China. ymluo@yic.ac.cn
2016-05-05
发表期刊JOURNAL OF HAZARDOUS MATERIALS
ISSN0304-3894
卷号308页码:199-207
产权排序[Wang, Anan; Teng, Ying; Wu, Longhua; Huang, Yujuan; Luo, Yongming; Christie, Peter] Chinese Acad Sci, Inst Soil Sci, Key Lab Soil Environm & Pollut Remediat, Nanjing 210008, Jiangsu, Peoples R China; [Hu, Xuefeng; Luo, Yongming] Chinese Acad Sci, Yantai Inst Coastal Zone Res, Key Lab Coastal Zone Environm Processes & Ecol Re, Yantai 264003, Peoples R China
摘要Diphenylarsinic acid (DPAA) is a major contaminant in environments polluted by chemical weapons and abandoned after World Wars I and II and poses high risks to biota but remediation methods for this contaminant are rare. Here, the photodegradtion of DPAA was studied under high-pressure Hg lamp irradiation. DPAA was degraded completely into inorganic arsenic species in 30 min under UV-C irradiation. The photodegradation of DPAA depended mainly on its direct photolysis through excited-state DPAA. By contrast, the generation of O-1(2) during the photodegradation of DPAA was confirmed by electron paramagnetic resonance (EPR) studies, but O-1(2) had little effect on the photodegradation of DPAA. Phtotodegradation of DPAA was also studied in soil leachates and groundwater and the photolytic rate of DPAA was controlled by the total organic carbon (TOC) content in soil leachates and by the NO3- concentration in groundwater. Finally, studies on the effects of common solutes on the photodegradation of DPAA show that Cl- can increase the photolytic rate of DPAA by prolonging the lifetime of excited state DPAA. Moreover, NO3-, NO2-, and humic acid (HA) can decrease the photolytic rate of DPAA by suppressing the production of excited-state DPAA. This research shows the detailed mechanism of DPAA photodegradation and provides a new and effective method for DPAA decontamination. (C) 2016 Elsevier B.V. All rights reserved.
关键词Diphenylarsinic Acid Photodegradation Electron Paramagnetic Resonance Pseudo-first-order Kinetics
作者部门中科院海岸带环境过程与生态修复重点实验室
DOI10.1016/j.jhazmat.2016.01.049
项目资助者National Natural Science Foundation of China(41230858 ; 41171248 ; 41571310)
收录类别SCI
关键词[WOS]CHEMICAL WARFARE AGENTS ; ZEA-MAYS L. ; PHOTOCHEMICAL DEGRADATION ; ORGANIC-MATTER ; PHENYLARSONIC ACID ; ADVANCED OXIDATION ; AQUEOUS-SOLUTION ; ARSANILIC ACID ; BY-PRODUCTS ; WATER
文章类型Article
语种英语
WOS研究方向Engineering ; Environmental Sciences & Ecology
WOS记录号WOS:000374803600025
引用统计
被引频次:3[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.yic.ac.cn/handle/133337/17051
专题中科院海岸带环境过程与生态修复重点实验室
通讯作者Luo, YM (reprint author), Chinese Acad Sci, Inst Soil Sci, Key Lab Soil Environm & Pollut Remediat, Nanjing 210008, Jiangsu, Peoples R China. ymluo@yic.ac.cn
作者单位1.Chinese Acad Sci, Inst Soil Sci, Key Lab Soil Environm & Pollut Remediat
2.Chinese Acad Sci, Yantai Inst Coastal Zone Res, Key Lab Coastal Zone Environm Processes & Ecol Re
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Wang, AA,Teng, Y,Hu, XF,et al. Photodegradation of diphenylarsinic acid by UV-C light: Implication for its remediation[J]. JOURNAL OF HAZARDOUS MATERIALS,2016,308:199-207.
APA Wang, AA.,Teng, Y.,Hu, XF.,Wu, LH.,Huang, YJ.,...&Luo, YM .(2016).Photodegradation of diphenylarsinic acid by UV-C light: Implication for its remediation.JOURNAL OF HAZARDOUS MATERIALS,308,199-207.
MLA Wang, AA,et al."Photodegradation of diphenylarsinic acid by UV-C light: Implication for its remediation".JOURNAL OF HAZARDOUS MATERIALS 308(2016):199-207.
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